Substrate liquid processing apparatus, substrate liquid processing method and recording medium

A substrate liquid processing apparatus configured to perform a liquid processing on a substrate by supplying a processing liquid onto the substrate, the substrate liquid processing apparatus comprising:

• a substrate holding unit configured to hold the substrate;
• a processing liquid supply unit configured to supply the processing liquid onto a top surface of the substrate held by the substrate holding unit;
• and
• a cover body configured to cover the substrate held by the substrate holding unit,
• wherein the cover body comprises a ceiling unit disposed above the substrate, a sidewall unit downwardly extended from the ceiling unit, and a heating unit provided at the ceiling unit and configured to heat the processing liquid on the substrate, and
• the sidewall unit of the cover body is placed at an outer periphery side of the substrate when the processing liquid on the substrate is heated.