Cvd reactor with a multi-zone heated process chamber
AssigneeEpiluvac AB
InventorsRichard SPENGLER, Roger NILSSON, Jonas ROSBERG
Life of this patent
Estimating the term…
Abstract
A device, system and method for depositing crystalline layers on at least one crystalline substrate is described. The disclosure includes the use of a multi zone heater, the multi zone heater is disposed between a reactor housing and a process chamber. The multi zone heater has different electrical properties along its length, whereby the multi zone heater when heated by eddy currents induced by an RF field generated by a RF heating coil provides a temperature profile inside the multi zone heater that varies along the length of the multi zone heater for heating the process chamber.
Claims10
A multi zone heater for providing a temperature profile for heating a process chamber used for depositing crystalline layers on at least one crystalline substrate, the multi zone heater comprises comprising:
- at least two heating zones made of an electric conducting material, and a first zone of the at least two zones having different electrical properties than a second zone of the at least two zones;
- wherein the multi zone heater has different electrical properties along a length.
A process chamber for depositing crystalline layers on at least one crystalline substrate, the process chamber comprising:
- an inner bottom surface having a length and being configured for holding a substrate carrier, the inner bottom surface having at least two grooves arranged along the length of the inner bottom surface;
- a substrate carrier having a height and being configured for holding a substrate, the substrate carrier having an at least one recess arranged along an outer rim;
- wherein, when in use the substrate carrier is arranged at the inner bottom surface, and at least two elongated elements can be slid into the grooves and engaged with the at least one recess whereby the substrate carrier is loaded or re-loaded.
A method for heating a process chamber used for depositing crystalline layers on at least one crystalline substrate, comprising:
- providing a temperature profile for heating said process chamber using a multi zone heater which comprises at least two heating zones made of an electrically conducting material, a first zone of the at least two zones having different electrical properties than a second zone of said at least two zones;
- whereby the multi zone heater has different electrical properties along a length.
Dependencies are inferred from the claim text.