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US 2018/0002804 A1Published application
Laminate and method of producing the same, and gas barrier film and method of producing the same
AssigneeToppan Printing Co., Ltd.
InventorsHiroshi KOYAMA, Jin SATO, Mitsuru KANO
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Abstract
A laminate that improves barrier properties of an atomic layer deposition film in spite of use of a substrate made of a polymer material, and provides a gas barrier film and a method of producing the same. The laminate includes: a substrate made a polymer material; an undercoat layer disposed on at least part of a surface of the substrate and made up of an inorganic material containing Ta; and an atomic layer deposition film disposed so as to cover a surface of the undercoat layer.
Claims7
A laminate, comprising:
- a substrate made of a polymer material;
- an undercoat layer disposed on at least part of a surface of the substrate and made of an inorganic material containing elemental Ta;
- and,
- an atomic layer deposition film disposed on at least part of a surface of the undercoat layer.
1 more element
A method of producing a laminate, comprising the steps of:
- forming an undercoat layer by using an inorganic material containing elemental Ta on at least part of a surface of a substrate made of a polymer material disposed in a vacuum chamber;
- and,
- forming an atomic layer deposition film on at least part of a surface of the undercoat layer by supplying a precursor serving as a raw material for deposition on the surface of the undercoat layer.
Dependencies are inferred from the claim text.