Deposition mask, deposition device, and deposition mask manufacturing method
AssigneeSharp Kabushiki Kaisha
InventorsMANABU NIBOSHI, SHINICHI KAWATO, YUHKI KOBAYASHI, KAZUO TAKIZAWA
Life of this patent
Estimating the term…
Abstract
The present invention is directed to a method for manufacturing a vapor deposition mask (2) which includes a mask section (3) and a mask frame (4). The mask section (3) includes an alloy containing iron and nickel. The method includes a heat treatment step of carrying out heat treatment with respect to the mask section (3) in a state in which end parts of the mask section (3) are fixed to the mask frame (4) while tension is applied to the mask section (3).
Claims16
A method for manufacturing a vapor deposition mask which includes a mask section and a mask frame, the mask section being provided with an opening for forming a film of a vapor deposition material on a film formation target substrate, and the mask section including an alloy containing iron and nickel,
- said method comprising:
- a heat treatment step of carrying out heat treatment with respect to the mask section in a state in which end parts of the mask section are fixed to the mask frame while tension is applied to the mask section.
A vapor deposition mask comprising:
- a mask section which is provided with an opening for forming a film of a vapor deposition material on a film formation target substrate;
- and
- a mask frame,
- end parts of the mask section being fixed to the mask frame ill a state in which tension is applied to the mask section,
- the mask section including an alloy containing iron and nickel, and
- crystals constituting the alloy being isotropically oriented.
A method for manufacturing an EL display device wherein:
- a luminescent layer of the EL display device is formed as a vapor-deposited film by depositing a vapor deposition material, which has been emitted from a vapor deposition source via an opening of a vapor deposition mask, onto a film formation target substrate,
- the vapor deposition mask including a mask section and a mask frame, the mask section being provided with the opening for forming a film of the vapor deposition material on the film formation target substrate, end parts of the mask section being fixed to the mask frame in a state in which tension is applied to the mask section, the mask section including an alloy containing iron and nickel, crystals constituting the alloy being isotropically oriented, and the vapor deposition source being arranged across the vapor deposition mask from the film formation target substrate.
Dependencies are inferred from the claim text.