Resin composition for underlayer film formation, imprint forming kit, laminate, pattern forming method, and method for producing device
AssigneeFUJIFILM Corporation
InventorsTadashi OOMATSU, Hirotaka KITAGAWA, Yuichiro GOTO
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Abstract
Disclosed herein are a resin composition for underlayer film formation which is capable of forming an underlayer film having good adhesiveness to a base material and good surface state, an imprint forming kit, a laminate, a pattern forming method, and a method for producing a device. Provided is a resin composition for underlayer film formation, including a resin, a nucleophilic catalyst, and a solvent, in which the content of the nucleophilic catalyst is 0.01 to 0.3 mass % with respect to the solid content of the resin composition for underlayer film formation.
Claims12
A resin composition for underlayer film formation, comprising:
- a resin;
- a nucleophilic catalyst;
- and
- a solvent,
- wherein the content of the nucleophilic catalyst is 0.01 to 3 mass % with respect to the solid content of the resin composition for underlayer film formation.
Dependencies are inferred from the claim text.