Substrate processing apparatus

A substrate processing apparatus comprising:

• a polishing part configured to polish a substrate;
• a transporting part configured to transport a substrate before polishing to the polishing part;
• and
• a cleaning part configured to clean a polished substrate, wherein
• the polishing part has
• a first polishing unit and a second polishing unit, and
• a polishing-part transport mechanism arranged adjacent to the transporting part and each of the first polishing unit and the second polishing unit;
• and
• the polishing-part transport mechanism has
• a first transport unit configured to transport a substrate to the first polishing unit,
• a second transport unit configured to transport a substrate to the second polishing unit, and
• a transport robot disposed between the first transport unit and the second transport unit, and configured to transfer a substrate between the transporting part, and the first transport unit and the second transport unit.

A substrate processing apparatus comprising:

• a polishing part configured to polish a substrate;
• a transporting part configured to transport a substrate before polishing to the polishing part;
• and
• a cleaning part configured to clean a polished substrate, wherein
• the polishing part has
• N pieces of polishing devices, N being a natural number of 2 or more,
• a transport unit configured to transport a substrate to each of the N pieces of polishing devices, and
• a transport robot configured to transfer a substrate between the transporting part and the transport unit;
• and
• the transport unit has
• N pieces of pushers respectively arranged at N locations of substrate-transport positions for the respective N pieces of polishing devices, and configured to vertically move, and
• an exchanger having N pieces of stages vertically arranged in N stages, and configured to horizontally move independently from each other, between a standby position for transfer of a substrate with the transport robot and the N locations of substrate-transport positions.

A substrate processing apparatus comprising:

• a polishing part configured to polish a substrate;
• a transporting part configured to transport a substrate before polishing to the polishing part;
• and
• a cleaning part configured to clean a polished substrate, wherein
• the cleaning part has
• a plurality of cleaning modules arranged in series, and
• a cleaning-part transport mechanism configured to transport a substrate between the cleaning modules each;
• and
• the cleaning-part transport mechanism has
• a pair of arms that are openable/closable and configured to hold a substrate,
• a vertical-moving mechanism configured to vertically move the pair of arms,
• a rotating mechanism configured to rotate the pair of arms around a rotating shaft that is in parallel with an opening/closing direction, and
• an arm-transport mechanism configured to linearly move the pair of arms along an arrangement direction of the plurality of cleaning modules.