Flux applying method and flux applying apparatus
AssigneeFujitsu Ten Limited
InventorsHisaki Hayashi, Yasuyuki Watanabe
Life of this patent
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Abstract
There is provided a flux applying method using a flux applying apparatus configured to jet and apply a flux to a target. The flux is supplied to a nozzle of the flux applying apparatus. A gas is applied to a foaming pipe with a porous filter included in the nozzle. The gas is jetted from the porous filter of the foaming pipe to the flux supplied to the nozzle, thereby jetting foamed flux to the target.
Claims6
A flux applying method using a flux applying apparatus configured to jet and apply a flux to a target, the method comprising:
- supplying the flux to a nozzle of the flux applying apparatus;
- supplying a gas to a foaming pipe with a porous filter included in the nozzle;
- and
- jetting the gas from the porous filter of the foaming pipe to the flux supplied to the nozzle, thereby jetting foamed flux to the target.
A flux applying apparatus configured to jet and apply a flux to a target, the flux applying apparatus comprising:
- a main tank configured to accommodate therein the flux;
- a piping configured to pass therethrough the flux which is to be transported from the main tank;
- and
- a nozzle comprising a foaming pipe with a porous filter and configured to jet a gas from the porous filter of the foaming pipe to the flux supplied via the piping, thereby jetting a foamed flux.
Dependencies are inferred from the claim text.