Flux applying apparatus
AssigneeFujitsu Ten Limited
InventorHisaki Hayashi
Life of this patent
Estimating the term…
Abstract
There is provided a flux applying apparatus configured to jet and apply a flux to a target. A main tank is configured to accommodate therein the flux. A feed pipe is configured to pass therethrough the flux which is to be pneumatically transported with a gas pressure when an inside of the main tank is at a positive pressure. A nozzle is configured to jet the flux transported via the feed pipe. A sub-tank is configured to trap therein the flux jetted from the nozzle. A return pipe is configured to communicate the sub-tank and the main tank each other and to return the flux to the main tank with a gas pressure when the inside of the main tank is at a negative pressure.
Claims2
A flux applying apparatus configured to jet and apply a flux to a target, the flux applying apparatus comprising:
- a main tank configured to accommodate therein the flux;
- a feed pipe configured to pass therethrough the flux which is to be pneumatically transported with a gas pressure when an inside of the main tank is at a positive pressure;
- a nozzle configured to jet the flux transported via the feed pipe;
- a sub-tank configured to trap therein the flux jetted from the nozzle;
- and
- a return pipe configured to communicate the sub-tank and the main tank each other and to return the flux to the main tank with a gas pressure when the inside of the main tank is at a negative pressure.
Dependencies are inferred from the claim text.