Cleaning device
AssigneeMitsubishi Electric Corporation
InventorsYohei SHIBATA, Akio MASUDA
Life of this patent
Estimating the term…
Abstract
A cleaning device is configured to include a first cleaning tank that holds water to which a small amount of an additive is added as a first cleaning fluid, a second cleaning tank that holds water, a water-based cleaning agent, an alkaline cleaning fluid, or a hydrophilic organic solvent as a second cleaning fluid, a first microscopic air bubble generation device, a first circulating pump, an ultrasonic wave emitting device, and a carrier device. Hydrophobic oil is removed by a cleaning target being exposed to the first cleaning fluid including microscopic air bubbles sprayed from a nozzle in an interior of the first cleaning tank, after which hydrophilic oil is removed by ultrasonic cleaning in the second cleaning tank.
Claims17
1-12. (canceled)
A cleaning device, comprising:
- a first cleaning tank that holds a first cleaning fluid;
- a first microscopic air bubble generation device that generates microscopic air bubbles in the first cleaning fluid;
- a first circulating pump that causes the first cleaning fluid to circulate and supplies the first cleaning fluid including microscopic air bubbles to the first cleaning tank;
- a second cleaning tank that holds a second cleaning fluid;
- an ultrasonic wave emitting device that irradiates an interior of the second cleaning tank with an ultrasonic wave;
- and
- a carrier device that holds a cleaning target, conveys the cleaning target to the first cleaning tank, and subsequently continues by conveying the cleaning target to the second cleaning tank, wherein
- water to which an additive that prevents air bubble coalescence is added is used as the first cleaning fluid, one of water, a water-based cleaning agent, an alkaline cleaning fluid, or a hydrophilic organic solvent is used as the second cleaning fluid, the first cleaning tank has a nozzle that sprays the first cleaning fluid above a surface of the first cleaning fluid in an interior of the first cleaning tank, and the carrier device conveys the cleaning target into the interior of the first cleaning tank, and causes the cleaning target to pass through a region in which the first cleaning fluid is sprayed from the nozzle.
A cleaning device, comprising:
- a first cleaning tank that holds a first cleaning fluid;
- a first microscopic air bubble generation device that generates microscopic air bubbles in the first cleaning fluid;
- a first circulating pump that causes the first cleaning fluid to circulate and supplies the first cleaning fluid including microscopic air bubbles to the first cleaning tank;
- a second cleaning tank that holds a second cleaning fluid;
- an ultrasonic wave emitting device that irradiates an interior of the second cleaning tank with an ultrasonic wave;
- and
- a carrier device that holds a cleaning target, conveys the cleaning target to the first cleaning tank, and subsequently continues by conveying the cleaning target to the second cleaning tank, wherein
- water to which an additive that prevents air bubble coalescence is added is used as the first cleaning fluid, one of water, a water-based cleaning agent, an alkaline cleaning fluid, or a hydrophilic organic solvent is used as the second cleaning fluid, the first cleaning tank has a partitioning plate that divides a surface of the first cleaning fluid held in an interior of the first cleaning tank into two regions, those being a cleaning target introduction region into which the cleaning target is introduced and a cleaning target removal region from which the cleaning target is removed, the partitioning plate is installed leaving a gap with a bottom portion of the first cleaning tank through which the cleaning target can pass, the first circulating pump supplies the first cleaning fluid including microscopic air bubbles to the first cleaning tank, and the carrier device introduces the cleaning target from the cleaning target introduction region of the first cleaning tank, causes the cleaning target to pass below the partitioning plate, and removes the cleaning target from the cleaning target removal region.
Dependencies are inferred from the claim text.