Method for optimizing radiation beam intensity profile shape using dual multiple aperture devices

Abstract

The present invention is directed to multiple aperture devices (MADs) for beam shaping in x-ray imaging. Two or more of these binary filters can be placed in an x-ray beam in series to permit a large number of x-ray fluence profiles. However, the relationship between particular MAD designs and the achievable fluence patterns is complex. The present invention includes mathematical and physical models that are used within an optimization framework to find optimal MAD designs. Specifically, given a set of target fluence patterns, the present invention finds, for example, a dual MAD design that is a “best fit” in generating the desired fluence patterns. This process provides a solution for both the design of MAD filters as well as the control actuation that is required (relative motion between MADs) that needs to be specified as part of the operation of a MAD-based fluence field modulation system.

Dependencies are inferred from the claim text.