Three-dimensional memory device with amorphous barrier layer and method of making thereof

Abstract

Memory stack structures are formed through an alternating stack of insulating layers and sacrificial material layers. Backside recesses are formed by removal of the sacrificial material layers selective to the insulating layers and the memory stack structures. An electrically conductive, amorphous barrier layer can be formed prior to formation of a metal fill material layer to provide a diffusion barrier that reduces fluorine diffusion between the metal fill material layer and memory films of memory stack structures. The electrically conductive, amorphous barrier layer can be an oxygen-containing titanium compound or a ternary transition metal nitride.

Dependencies are inferred from the claim text.