Ffs mode array substrate and manufacturing method thereof

A manufacturing method of an FFS mode array substrate, comprising steps of:

• forming a base layer, wherein the base layer is provided with a gate electrode and a channel semiconductor layer;
• depositing a second insulation layer on the base layer, and forming a first through hole and a second through hole which are used to expose the channel semiconductor layer;
• depositing a pixel electrode layer on the second insulation layer, wherein the pixel electrode layer is provided with a plurality of pixel electrode regions and first spacing regions located between each two of the pixel electrode regions;
• depositing a first metal layer on the pixel electrode layer, wherein the first metal layer is provided with a source electrode region, a drain electrode region, and a second spacing region located between the source electrode region and the drain electrode region;
• coating a first photoresist layer on the first metal layer, and removing photoresist of the first photoresist layer which corresponds to the first spacing regions and the second spacing regions;
• etching the first metal layer and the pixel electrode layer to respectively form a source electrode and a drain electrode in the source electrode region and the drain electrode region of the first metal layer, and to form a plurality of pixel electrodes in the pixel electrode regions of the pixel electrode layer;
• removing the first photoresist layer, and removing the first metal layer which is on the pixel electrodes;
• and
• depositing a third insulation layer on the source electrode, the drain electrode, the pixel electrodes and the second insulation layer.