Beam Trap, Beam Guide Device, EUV Radiation Generating Apparatus, and Method for Absorbing a Beam
AssigneeTRUMPF Lasersystems for Semiconductor Manufacturing GmbH
InventorMartin Lambert
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AssigneeTRUMPF Lasersystems for Semiconductor Manufacturing GmbH
InventorMartin Lambert
Estimating the term…
The disclosure relates to a beam trap including: a reflector for reflecting a beam, in particular a laser beam, that is incident on a surface of the reflector, and an absorber device for absorbing the beam reflected at the surface of the reflector. The surface of the reflector is segmented and has a plurality of reflector regions that are configured for reflecting a respective partial beam of the incident beam into an absorber region of the absorber device that is associated with the respective reflector region. The disclosure also relates to a beam guide device having a beam trap of this type, an EUV radiation generation apparatus having a beam guide device of this type, and an associated method for absorbing a beam, in particular for absorbing a laser beam.
A beam trap comprising:
Abeam guide device, comprising:
An EUV beam generation apparatus, comprising:
A method for absorbing a beam, comprising:
Dependencies are inferred from the claim text.