Combiner and distributor for adjusting impedances or power across multiple plasma processing stations

A combiner and distributor comprising:

• a first frequency circuit coupled to a first radio frequency (RF) generator via a first matching network to receive a first modified RF signal of a first frequency from the first matching network, wherein the first frequency circuit is configured to output a plurality of RF signals upon receiving the first modified RF signal;
• a second frequency circuit coupled to a second RF generator via a second matching network to receive a second modified RF signal of a second frequency from the second matching network, wherein the second frequency circuit is configured to output a plurality of RF signals upon receiving the second modified RF signal, wherein the second frequency circuit is coupled to the first frequency circuit;
• an output circuit coupled to the second frequency circuit, wherein the output circuit is configured to combine each of the RF signals output from the first frequency circuit with a corresponding one of the RF signals output from the second frequency circuit to provide a plurality of combined RF signals to a plurality of plasma processing stations,
• wherein the output circuit has multiple outputs coupled to the plasma processing stations,
• wherein the first frequency circuit includes a plurality of first frequency tuning circuits for the first frequency to tune impedances associated with the plasma processing stations based on a parameter measured at the outputs of the output circuit,
• wherein the second frequency circuit includes a plurality of second frequency tuning circuits for the second frequency to tune the impedances associated with the plasma processing stations based on the parameter measured at the outputs of the output circuit.

A system comprising:

• a combiner and distributor including:
• a first frequency circuit coupled to a first radio frequency (RF) generator via a first matching network to receive a first modified RF signal of a first frequency from the first matching network, wherein the first frequency circuit is configured to output a plurality of RF signals upon receiving the first modified RF signal;
• a second frequency circuit coupled to a second RF generator via a second matching network to receive a second modified RF signal of a second frequency from the second matching network, wherein the second frequency circuit is configured to output a plurality of RF signals upon receiving the second modified RF signal, wherein the second frequency circuit is coupled to the first frequency circuit;
• an output circuit coupled to the second frequency circuit, wherein the output circuit is configured to combine each of the RF signals output from the first frequency circuit with a corresponding one of the RF signals output from the second frequency circuit to provide a plurality of combined RF signals to a plurality of plasma processing stations,
• wherein the output circuit has multiple outputs coupled to the plasma processing stations,
• wherein the first frequency circuit includes a plurality of first frequency tuning circuits for the first frequency,
• wherein the second frequency circuit includes a plurality of second frequency tuning circuits for the second frequency;
• and
• a system controller coupled to the combiner and distributor,
• wherein the system controller is configured to tune the first frequency tuning circuits based on a parameter measured at the outputs of the output circuit,
• wherein the system controller is configured to tune the second frequency tuning circuits based on the parameter measured at the outputs of the output circuit.