Piezoelectric substrate and method of manufacturing the piezoelectric substrate, and liquid ejection head

A method of manufacturing a piezoelectric substrate, comprising:

• forming one of Ti and TiO2 into a film as an intermediate layer on a SiO2 layer of a substrate including the SiO2 layer as an outermost surface layer;
• forming Pt into a film as a lower electrode on the intermediate layer at a substrate temperature within a range of from 10° C. to 50° C.;
• forming a first precursor layer by applying a first coating liquid containing a lead titanate precursor onto the lower electrode, followed by drying the first coating liquid;
• forming a second precursor layer by applying a second coating liquid containing a lead zirconate titanate precursor having a composition represented by Pbx(Zr(y)Ti(1-y))O3, where x=1.0 to 1.2 and 0.4<y<0.6, onto the first precursor layer, followed by drying the second coating liquid at a temperature within a range of from 330° C. to 360° C.;
• and
• collectively crystallizing the first precursor layer and the second precursor layer.

A liquid ejection head comprising:

• a piezoelectric substrate comprising:
• a substrate including a SiO2 layer as an outermost surface layer;
• an intermediate layer made of one of Ti and TiO2, which is formed on the SiO2 layer of the substrate;
• a lower electrode made of Pt, which is formed on the intermediate layer;
• an orientation control layer containing lead titanate, which is formed on the lower electrode;
• and
• a piezoelectric layer, which is formed on the orientation control layer,
• the piezoelectric layer containing lead zirconate titanate having a composition represented by Pbx(Zr(y)Ti(1-y))O3, where x=1.0 to 1.2 and 0.4<y<0.6,
• the piezoelectric layer having a ratio of a reflection intensity of a (110) plane with respect to a total reflection intensity of a (100) plane, the (110) plane, and a (111) plane of 70% or more, which is measured by an X-ray diffraction method, and having an average particle diameter of crystal particles in a surface of 1.0 μm or less;
• a liquid ejection orifice configured to eject a liquid;
• and
• a pressure chamber communicating to the liquid ejection orifice.