Charge Trapping Prevention III-Nitride Transistor
AssigneeInfineon Technologies Americas Corp.
InventorsHyeongnam Kim, Mohamed Imam, Alain Charles, Jianwei Wan, Mihir Tungare, Chan Kyung Choi
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AssigneeInfineon Technologies Americas Corp.
InventorsHyeongnam Kim, Mohamed Imam, Alain Charles, Jianwei Wan, Mihir Tungare, Chan Kyung Choi
Estimating the term…
There are disclosed herein various implementations of a charge trapping prevention III-Nitride transistor. Such a transistor may be a III-Nitride high electron mobility transistor (HEMT) including a III-Nitride intermediate body situated over a substrate, a channel layer situated over the III-Nitride intermediate body, and a barrier layer situated over the channel layer. The channel layer and the barrier layer are configured to produce a two-dimensional electron gas (2DEG). In addition, the III-Nitride transistor includes a dielectric layer situated over the barrier layer, a gate coupled to the barrier layer, and a drain electrode and a source electrode each extending through the dielectric layer. The drain electrode makes ohmic contact with one or both of the barrier layer and a charge trapping prevention layer situated between the dielectric layer and the barrier layer.
A III-Nitride high electron mobility transistor (HEMT) comprising:
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A III-Nitride high electron mobility transistor (HEMT) comprising:
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Dependencies are inferred from the claim text.