Optimizing Layout of Irregular Structures in Regular Layout Context

A method for manufacturing an integrated circuit, comprising:

• forming a first conductive structure having a first length as measured in a first direction and a first width as measured in a second direction perpendicular to the first direction, the first conductive structure having a lengthwise centerline positioned on a first virtual line of a virtual grate, the virtual grate including a plurality of lines spaced at a uniform pitch;
• forming a second conductive structure having a second length as measured in the first direction and a second width as measured in the second direction, the second width substantially equal to the first width, the second conductive structure having a lengthwise centerline positioned on a second virtual line of the virtual grate, the virtual grate including at least two virtual lines interposed between the first virtual line and the second virtual line;
• forming a third conductive structure having a third length as measured in the first direction and a third width as measured in the second direction, the third width less than the second width, the third conductive structure positioned beside the second conductive structure and between the first conductive structure and the second conductive structure, the third conductive structure separated from the second conductive structure by a first spacing as measured in the second direction;
• and
• forming a fourth conductive structure having a fourth length as measured in the first direction and a fourth width as measured in the second direction, the fourth width substantially equal to the third width, the fourth conductive structure positioned beside the first conductive structure and between the first conductive structure and the second conductive structure, the fourth conductive structure separated from the first conductive structure by the first spacing as measured in the second direction.