Rf return strap shielding cover
AssigneeApplied Materials, Inc.
InventorsYi CUI, Robin L. TINER, Beom Soo PARK, Soo Young CHOI, Shinichi KURITA
Life of this patent
Estimating the term…
Abstract
Embodiments described herein generally relate to a substrate support assembly having a shield cover. In one embodiment, a substrate support assembly is disclosed herein. The substrate support assembly includes a support plate, a plurality of RF return straps, at least one shield cover, and a stem. The support plate is configured to support a substrate. The plurality of RF return straps are coupled to a bottom surface of the support plate. At least one shield cover is coupled to the bottom surface of the support plate, between the plurality of RF return straps and the bottom surface. The stem is coupled to the support plate.
Claims20
A substrate support assembly, comprising:
- a support plate having an upper surface configured to support a substrate;
- a stem coupled to a bottom surface of the support plate;
- a plurality of RF return straps coupled to the support plate, the plurality of RF return straps extending below the bottom surface of the support plate;
- at least one shield cover coupled to the support plate, wherein the at least one shield covers at least one a portion of a side of at least one of the plurality of RF return straps closest a perimeter of the support plate.
A processing chamber, comprising:
- a chamber body comprising a top wall, a sidewall, and a bottom wall defining a processing region in the chamber body;
- and
- a substrate support assembly disposed in the processing region, the substrate support assembly, comprising:
- a support plate having an upper surface configured to support a substrate;
- a stem coupled to a bottom surface of the support plate;
- a plurality of RF return straps coupled to the support plate, the plurality of RF return straps extending below the bottom surface of the support plate;
- at least one shield cover coupled to the support plate, wherein the at least one shield covers at least one a portion of a side of at least one of the plurality of RF return straps closest a perimeter of the support plate.
A method of processing a substrate, comprising:
- generating a plasma within the processing chamber, wherein RF current utilized to generate the plasma travels through an RF return strap coupling the substrate support assembly and a body of the processing chamber, the substrate support assembly having a shield cover disposed between chamber body and a portion of the RF return strap;
- and
- depositing a layer of material on the substrate disposed on the substrate support assembly while the substrate is exposed to the plasma.
Dependencies are inferred from the claim text.