Coil filament for plasma enhanced chemical vapor deposition source
AssigneeSeagate Technology LLC
InventorsRomulo Ata, ZhaoHui Fan, Samuel Tanaka, Christopher Platt, Xiaoding Ma
Life of this patent
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Abstract
A vapor deposition source that includes a substantially vertical plate to which first and second filament posts are coupled. The vapor deposition source also includes a filament having a first end and a second end. The filament provides a substantially concentric source of electrons. The first end of the filament is connected to the first filament post and the second end of the filament is connected to the second filament post. The first end of the filament is substantially vertically aligned with the second end of the filament when the filament is connected to the first and second posts.
Claims21
A chemical vapor deposition source comprising:
- a substantially vertical plate;
- first and second filament posts coupled to the plate;
- a filament having a first end and a second end,
- wherein the filament is configured to provide a substantially concentric source of electrons, and
- wherein the first end of the filament is connected to the first filament post and the second end of the filament is connected to the second filament post, and
- wherein the first end of the of the filament is substantially vertically aligned with the second end of the filament when the filament is connected to the first and second posts.
A filament comprising:
- a first end configured to couple to a first filament post of a chemical vapor deposition source;
- a second end configured to couple to a second filament post of the chemical vapor deposition source;
- a first curved arm connected to the first end of the filament;
- a second curved arm connected to the second end of the filament;
- and
- a transition region between the first curved arm and the second curved arm, and wherein a first end of the transition region is connected to the first curved arm and a second end of the transition region is connected to the second curved arm.
A vapor deposition tool comprising:
- a plasma enhanced chemical vapor deposition source having a vertically positioned filament that is configured to provide a substantially concentric source of electrons,
- wherein the vertically positioned filament comprises a first end and a second end, and
- wherein the first end of the filament is substantially vertically aligned with the second end of the filament.
(canceled)
Dependencies are inferred from the claim text.