Nanoimprinting method, and method for producing a droplet arrangement pattern
AssigneeFUJIFILM Corporation
InventorsSatoshi WAKAMATSU, Tadashi OMATSU
Life of this patent
Estimating the term…
Loading patent…
AssigneeFUJIFILM Corporation
InventorsSatoshi WAKAMATSU, Tadashi OMATSU
Estimating the term…
The disclosed nanoimprinting method suppresses fluctuations in thickness of residual film and defects due to residual gas in a resist film, onto which a pattern of protrusions and recesses is transferred, in a nanoimprinting method that employs the ink jet method to coat a substrate with droplets of resist material. Droplets are coated onto a substrate such that the spaces between the droplets along an A direction which is substantially parallel to the direction of the lines of a linear pattern of protrusions and recesses are longer than the spaces between the droplets in a B direction which is substantially perpendicular to the A direction, in a nanoimprinting method that coats a substrate with the droplets of a resist material using the ink jet method.
A nanoimprinting method, comprising:
7-19. (canceled)
Dependencies are inferred from the claim text.