Atomic layer deposition apparatus

Apparatus (1) for atomic layer deposition comprising a frame (2) and an injector head (40) provided with longitudinal slots for respectively supplying gasses to respective deposition spaces (41,42,43,44,45,46,47) confined by the longitudinal slots (48,49) and a substrate (8), wherein the longitudinal slots are directed transverse to a movement in a first direction (X) of the substrate (8) with respect to the injector head (40),

• the apparatus further comprising
• a sub frame (52) arranged to suspend the injector head;
• a movable carrier (30) arranged to support the substrate (8) for the movement in the first direction (X);
• and
• gas pads (53,54,55) positioned at the sub frame 52 outside the injector head (40) between the sub frame 52 and the moveable carrier (30) to bear the sub frame (52) on the moveable carrier (30) for the movement in the first direction (X) of the substrate (8) under the injector head (40), wherein the apparatus further comprises
• actuators (60,61,62) for suspending the injector head (40) from the sub frame (52);
• and
• a control device (100) connected to the actuators (60,61,62) and arranged to control the actuators to adjust a working distance between a reference plane of the injector head (40) and the surface of the substrate (8) corresponding to a predetermined distance and to adjust an orientation of the injector head (40) corresponding to an orientation of the substrate (8).