Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature cvd systems
AssigneeApplied Materials, Inc.
InventorsDavid Keith CARLSON, Satheesh KUPPURAO, Howard BECKFORD, Herman DINIZ, Kailash Kiran PATALAY, Brian Hayes BURROWS, Jeffery Ronald CAMPBELL, Zuoming ZHU, Xiaowei LI, Errol Antonio SANCHEZ
Life of this patent
Estimating the term…