Composition for film formation, and pattern-forming method

A composition for film formation comprising:

• a hydrolysis compound which is
• a hydrolysis product of a metal compound comprising a hydrolyzable group,
• a hydrolytic condensation product of the metal compound,
• a condensation product of the metal compound and a compound represented by formula (1), or
• a combination thereof;
• and
• a solvent composition,
• R1X1)n (1)
• wherein in the formula (1),
• R1 represents an organic group having a valency of n;
• X1 represents —OH, —COOH, —NCO or —NHRa;
• Ra represents a hydrogen atom or a monovalent organic group;
• n is an integer of 2 to 4;
• and
• a plurality of X1s are identical or different, and
• wherein,
• the metal compound comprises at least one metal element selected from the group consisting of Cr, Mo, W, Zn, Cd, Hg, B, Al, Ga, and In,
• the solvent composition comprises an alcohol organic solvent, and a non-alcohol organic solvent that does not comprise an alcoholic hydroxyl group and that comprises a group comprising a hetero atom,
• a content of the alcohol organic solvent with respect to a mass of the solvent composition is no less than 1% by mass and no greater than 50% by mass, and
• a content of the non-alcohol organic solvent with respect to the mass of the solvent composition is no less than 50% by mass and no greater than 99% by mass.