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AssigneeTokyo Electron Limited
InventorsNobuhiro Ogata, Norihiro Ito, Jiro Higashijima, Yusuke Hashimoto, Kazuhiro Aiura
Estimating the term…
According to the present disclosure, both first and second cup bodies are brought into a state of being close to each other by lifting one of the first and second cup bodies. A first gap between a gap forming portion formed on the lower surface of a first protruding portion and the upper surface of a second protruding portion is narrower than a second gap between a portion of the first protruding portion where the gap forming portion is absent, and the upper surface of the second protruding portion. In this state, a cleaning liquid is supplied to the second gap. Since movement of the cleaning liquid that tends to flow radially outward is restricted by the first narrow gap, the entire area between the first and second protruding portions may be filled with the cleaning liquid so that the surface to be cleaned may be evenly cleaned.
A substrate processing apparatus comprising:
A method of cleaning a substrate processing apparatus comprising:
A non-transitory computer-readable storage medium storing a program that, when executed by a computer that controls an operation of a substrate processing apparatus, causes the computer to control the substrate processing apparatus so as to execute a method of cleaning the substrate processing apparatus.
Dependencies are inferred from the claim text.