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US 2017/0361282 A1Published application
Zeolite film structure
AssigneeNGK Insulators, Ltd.
InventorsNaoto KINOSHITA, Hiroyuki SHIBATA
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Abstract
A zeolite film structure comprising a support, a zeolite film and a protective film. The zeolite film is formed on a surface of the support. The protective film is formed on a surface of the zeolite film. The protective film is configured from organic-nonorganic hybrid silica or carbon. An average thickness of the protective film is less than or equal to 172 nanometers and greater than or equal to 44 nanometers.
Claims5
A zeolite film structure comprising:
- a support,
- a zeolite film formed on a surface of the support, and
- a protective film formed on a surface of the zeolite film and configured from organic-nonorganic hybrid silica or carbon, wherein
- an average thickness of the protective film is less than or equal to 172 nanometers and greater than or equal to 44 nanometers.
1 more element
Dependencies are inferred from the claim text.