Patterned ion-sliced crystal for hybrid integrated photonics
AssigneeOhio State Innovation Foundation
InventorsRonald M. Reano, Li Chen
Life of this patent
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Abstract
An example method of forming a deterministic thin film from a crystal substrate is described herein. The method can include implanting ions into a surface of the crystal substrate to form a thin film crystal layer, and bonding the crystal substrate and a handle substrate to form a bilayer bonding interface between the crystal substrate and the handle substrate. The method can also include exfoliating the thin film crystal layer from the crystal substrate, patterning the thin film crystal layer to define a deterministic thin film, etching one or more trenches in the thin film crystal layer, etching the bilayer bonding interface via the one or more trenches, and releasing the deterministic thin film from the handle substrate.
Claims20
A method of forming a deterministic thin film from a crystal substrate, comprising:
- implanting ions into a surface of the crystal substrate to form a thin film crystal layer;
- bonding the crystal substrate and a handle substrate to form a bilayer bonding interface between the crystal substrate and the handle substrate, wherein the bilayer bonding interface comprises at least two different materials;
- exfoliating the thin film crystal layer from the crystal substrate;
- patterning the thin film crystal layer to define a deterministic thin film;
- etching one or more trenches in the thin film crystal layer;
- etching the bilayer bonding interface via the one or more trenches;
- and
- releasing the deterministic thin film from the handle substrate.
A heterogeneous integrated photonic device, comprising:
- a substrate having a waveguide patterned on a surface thereof;
- and
- an x-cut thin film crystal arranged on the substrate, wherein the x-cut thin film crystal at least partially overlaps with the waveguide.
Dependencies are inferred from the claim text.