Semiconductor element, semiconductor device, and method for manufacturing same
AssigneeNTT Electronics Corporation
InventorsMakoto SHIMIZU, Hiroki ITOH, Tadao ISHIBASHI, Isamu KOTAKA
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AssigneeNTT Electronics Corporation
InventorsMakoto SHIMIZU, Hiroki ITOH, Tadao ISHIBASHI, Isamu KOTAKA
Estimating the term…
A semiconductor element capable of adjusting a barrier height φBn and performing zero-bias operation and impedance matching with an antenna for improving detection sensitivity of high-frequency RF electric signals, a method of manufacturing the same, and a semiconductor device having the same. In the semiconductor element, a concentration of InGaAs (n-type InGaAs layer) is intentionally set to be high over a range for preventing the “change of the barrier height caused by the bias” described above up to a deep degeneration range. An electron Fermi level (EF) increases from a band edge of InGaAs (n-type InGaAs layer) to a band edge of InP (InP depletion layer).
A method of manufacturing a semiconductor element provided with a stacked diode structure obtained by stacking a first n-type semiconductor layer, a second semiconductor layer having electron affinity lower than that of the first semiconductor layer, and a third n-type semiconductor layer in this order from an anode side to a cathode side, the first and second semiconductor layers having a heterojunction,
A method of manufacturing a semiconductor element provided with a stacked diode structure obtained by stacking a first n-type semiconductor layer, a second semiconductor layer having electron affinity lower than that of the first semiconductor layer, and a third n-type semiconductor layer in this order from an anode side to a cathode side, the first and second semiconductor layers having a heterojunction,
A method of manufacturing a semiconductor element provided with a stacked diode structure obtained by stacking a first n-type semiconductor layer, a second semiconductor layer, and a third n-type semiconductor layer in this order from an anode side to a cathode side, the first and second semiconductor layers having a heterojunction,
A semiconductor element provided with a stacked diode structure obtained by stacking a first n-type semiconductor layer, a second semiconductor layer having electron affinity lower than that of the first semiconductor layer, and a third n-type semiconductor layer in this order from an anode side to a cathode side, the first and second semiconductor layers having a heterojunction,
A semiconductor element provided with a stacked diode structure obtained by stacking a first n-type semiconductor layer, a second semiconductor layer, and a third n-type semiconductor layer in this order from an anode side to a cathode side, the first and second semiconductor layers having a heterojunction,
A semiconductor device comprising:
The semiconductor device according to claim 14, wherein the electric high-frequency input circuit is a planar antenna formed on the semi-insulating semiconductor substrate.
A semiconductor device comprising:
Dependencies are inferred from the claim text.