Light absorption apparatus
AssigneeArtilux, Inc.
InventorsSzu-Lin CHENG, Shu-Lu CHEN
Life of this patent
Estimating the term…
Abstract
A light absorption apparatus includes a substrate, a light absorption layer above the substrate on a first selected area, a silicon layer above the light absorption layer, a spacer surrounding at least part of the sidewall of the light absorption layer, an isolation layer surrounding at least part of the spacer, wherein the light absorption apparatus can achieve high bandwidth and low dark current.
Claims28
A method for forming a light absorption apparatus, the method comprising:
- forming a stopping layer atop a substrate;
- forming an additional substrate layer atop the stopping layer;
- forming a photosensitive structure above the additional substrate layer;
- creating an opening on a backside of the substrate to expose a portion of the stopping layer;
- and
- forming, through the opening on the backside of the substrate, a reflector layer below the photosensitive structure,
- wherein the additional substrate layer comprises vertical holes in the exposed portion of the stopping layer.
A semiconductor fabrication system including one or more machines for fabricating a light absorption apparatus, the one or more machines configured to perform operations comprising:
- forming a stopping layer atop a substrate;
- forming an additional substrate layer atop the stopping layer;
- forming a photosensitive structure above the additional substrate layer;
- creating an opening on a backside of the substrate to expose a portion of the stopping layer;
- and
- forming, through the opening on the backside of the substrate, a reflector layer below the photosensitive structure,
- wherein the additional substrate layer comprises vertical holes in the exposed portion of the stopping layer.
Dependencies are inferred from the claim text.