Display device and manufacturing method thereof
AssigneeSamsung Display Co., Ltd.
InventorsJUN HYUN PARK, Sung Hwan KIM, Kyoung Ju SHIN
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Abstract
A display device and method of manufacture includes a substrate; a transistor disposed on the substrate to include a gate electrode, a semiconductor layer, a source electrode, a drain electrode, and a gate insulating layer disposed between the gate electrode and the semiconductor layer. A capacitor disposed on the substrate includes a first electrode, a second electrode, and a dielectric layer is disposed between the first electrode and the second electrode. The dielectric layer has a thickness that is thinner than a thickness of the gate insulating layer.
Claims20
A display device comprising:
- a substrate;
- a transistor disposed on the substrate including a gate electrode, a semiconductor layer, a source electrode, a drain electrode, and a gate insulating layer disposed between the gate electrode and the semiconductor layer;
- and
- a capacitor disposed on the substrate including a first electrode, a second electrode, and a dielectric layer disposed between the first electrode and the second electrode,
- wherein the dielectric layer has a thickness that is less than a thickness of the gate insulating layer.
A display device comprising:
- a substrate;
- a gate driver including a transistor and a capacitor, the transistor disposed on the substrate including a gate electrode, a semiconductor layer, a source electrode, a drain electrode, and a gate insulating layer disposed between the gate electrode and the semiconductor layer;
- the capacitor is disposed on the substrate and includes a first electrode and a second electrode and a dielectric layer disposed between the first electrode and the second electrode;
- and
- wherein the dielectric layer is a separate layer from the gate insulating layer, and a thickness of the dielectric layer is less than a thickness of the gate insulating layer.
Dependencies are inferred from the claim text.