An array substrate, its manufacturing method thereof and a liquid crystal display panel
AssigneeWuhan China Star Optoelectronics Technology Co., Ltd.
InventorWei WANG
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Abstract
A manufacturing method of an array substrate is provided in this invention, a protective layer for the channel is formed by magnetron sputtering and thermal annealing treatment with the oxygen concentration greater than 21%, at a temperature of 300˜400° C. and the material of the protection layer includes Al2O3. The present invention further includes an array substrate and a liquid crystal display panel with the array substrate. The present invention prevents the impurity such as hydrogen atom into the channel, and the quality of the protective layer prepared by the present invention is higher to ensure the electrical properties of the channel and process easy to be achieve and conducive to industrialization.
Claims10
A manufacturing method for an array substrate comprising:
- forming a first metal layer, an insulation layer and a semiconductor pattern layer subsequently;
- forming a second metal layer on the insulation layer and the semiconductor pattern layer, wherein the region of the second metal layer is an Al layer that corresponding to the semiconductor pattern layer, and the Al layer is formed by magnetron sputtering process;
- performing a thermal annealing treatment with the oxygen concentration greater than 21%, at a temperature of 300˜400° C., to make the Al layer have an oxidation reaction into a Al2O3 layer;
- etching the second metal layer with Al2O3 layer to obtain a protective layer having a predetermined size on the semiconductor pattern layer;
- and
- forming a third metal layer on the Al2O3 layer, the third metal layer is formed with a recess, and the recess exposed the corresponding Al2O3 layer.
An array substrate comprising:
- a base substrate;
- a first metal layer, an insulation layer and a semiconductor pattern layer subsequently formed;
- a protective layer formed on the semiconductor pattern layer, wherein the surface of the protective layer is an Al2O3 layer, wherein the Al2O3 layer is formed by a magnetron sputtering made Al layer, and into the Al2O3 layer by thermal annealing treatment with the oxygen concentration greater than 21%, at a temperature of 300˜400° C.;
- and
- a third metal layer formed on the Al2O3 layer, the third metal layer is formed with a recess, and the recess exposed the corresponding Al2O3 layer.
A liquid crystal display panel comprising an array substrate, a color filter substrate disposed opposite to the array substrate and a liquid crystal interposed between the array substrate and the color filter substrate wherein the array substrate comprising:
- a base substrate;
- a first metal layer, an insulation layer and a semiconductor pattern layer subsequently formed;
- a protective layer formed on the semiconductor pattern layer, wherein the surface of the protective layer is an Al2O3 layer, wherein the Al2O3 layer is formed by a magnetron sputtering made Al layer, and into the Al2O3 layer by thermal annealing treatment with the oxygen concentration greater than 21%, at a temperature of 300˜400° C.;
- and
- a third metal layer formed on the Al2O3 layer, the third metal layer is formed with a recess, and the recess exposed the corresponding Al2O3 layer.
Dependencies are inferred from the claim text.