Rotating and holding apparatus for semiconductor substrate and conveying apparatus of rotating and holding apparatus for semiconductor substrate
AssigneesVarios Co., Ltd., Micro System Co., Ltd.
InventorGyo YAMAMOTO
Life of this patent
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Abstract
A holding apparatus for a semiconductor substrate and a conveying apparatus for a semiconductor substrate. A susceptor is fixed to a rotational driving shaft to be attachable and detachable in a vertical direction, the opening portions are formed to extend through the susceptor in a thickness direction of the susceptor, and a meshing portion which meshes with the substrate holders releasably in a vertical direction so that the substrate holder can rotate according to rotation of the susceptor is provided below the susceptor.
Claims8
A rotating and holding apparatus for a semiconductor substrate which is used within a reacting furnace in order to form a film on a semiconductor substrate in a vapor-phase state by a metalorganic chemical vapor deposition and which has a susceptor formed in a disc shape to be rotationally moved, a plurality of substrate holders formed in a disc shape, attachably and detachably disposed within a plurality of opening portions provided in the susceptor in an opened fashion and formed to rotate within the opening portions according to rotation of the susceptor, and having upper face portions on which semiconductor substrates are put, and a rotational driving shaft provided below the susceptor and rotating the susceptor,
- wherein the susceptor is fixed to the rotational driving shaft to be attachable and detachable thereto in a vertical direction, the opening portions are formed to extend through the susceptor in a thickness direction of the susceptor, and
- a meshing portion with which the substrate holders mesh releasably in the vertical direction to rotate the substrate holders within the opening portions according to rotation of the susceptor is provided below the susceptor.
A conveying apparatus of a rotating and holding apparatus for a semiconductor substrate, which is used for forming a film on a semiconductor substrate in a vapor-phase state by a metalorganic chemical vapor deposition,
- where a susceptor formed in a disc shape, attachably and detachably engaging a rotational driving shaft disposed below the susceptor, and having substrate holders having semiconductor substrates put on upper faces of the substrate holders and rotatably disposed in a plurality of opening portions provided in an opened fashion is detachably attached to the rotational driving shaft or conveyed out, wherein a conveying arm portion holding the susceptor is provided.
Dependencies are inferred from the claim text.