Dielectric window supporting structure for inductively coupled plasma processing apparatus

A dielectric window supporting structure of inductively coupled plasma (ICP) processing apparatus that comprises

• a main container that houses a substrate to be processed to perform plasma processing,
• a substrate mounting unit on which the substrate to be processed is mounted in the main container,
• an exhaust system that discharges gas from inside of the main container,
• a plurality of dielectric windows that form an upper window of the main container,
• a dielectric supporting unit that is coupled to an upper end of the main container and supports the dielectric window to seal the inside of the main container, and
• one or more RF antennas which are installed to correspond to the plurality of the dielectric windows outside the main container and to which RF power is supplied to form an induced electric field in the main container,
• wherein the dielectric supporting unit includes:
• a central frame that includes an opening corresponding to a plan view of each dielectric window, the central frame including a supporting portion which supports a bottom edge of the dielectric window fitted in the opening, the central frame having a ceramic material in order to minimize power loss when the induced electric field by the RF antennas is formed;
• and
• an outer frame that has a metallic material, the outer frame being coupled to the central frame in a perimeter of the central frame to support the central frame, the outer frame being supported by the upper end of the main container.