Plasma treatment process for in-situ chamber cleaning efficiency enhancemnet in plasma processing chamber

A method for performing a plasma treatment process after a plasma cleaning process, comprising:

• performing a cleaning process in a plasma processing chamber in the absent of a substrate disposed therein;
• in-situ performing a plasma treatment process in the processing chamber by supplying a plasma treatment gas mixture including at least a hydrogen containing gas and/or an oxygen containing gas into the plasma processing chamber;
• and
• performing a seasoning process after the plasma treatment process in the processing chamber, wherein the cleaning process, plasma treatment process and the seasoning process are controlled by a single recipe having multiple steps integrated in the plasma processing chamber.

A method for performing a plasma treatment process after cleaning a plasma process, comprising:

• supplying a cleaning gas mixture including a fluorine containing gas supplied from a remote plasma source in a plasma processing chamber in the absent of a substrate;
• subsequently supplying a plasma treatment gas mixture including oxygen containing gas and hydrogen containing gas to form a plasma from a RF source power generated in the plasma treatment gas mixture to remove metal contaminants from an interior surface of the processing chamber;
• and
• subsequently supplying a seasoning film gas mixture to form a seasoning layer on the interior surface of the plasma processing chamber.