Defect quantification method, defect quantification device, and defect evaluation value display device
AssigneeHitachi High-Technologies Corporation
InventorsYohei MINEKAWA, Yuji TAKAGI, Takehiro HIRAI
Life of this patent
Estimating the term…
Abstract
To quantify the degree of a defect, and provide information useful for yield management. Disclosed is a defect quantification method wherein: a defect image is classified; a measurement region and a measurement area are set to each of the defect image and a reference image on the basis of defect image classification results, said reference image corresponding to the defect image; and an evaluation value of a defect is calculated using each of the measurement values obtained from each of the measurement areas of the defect image and the reference image, and the defect is quantified.
Claims19
A defect quantification method for calculating a.n & valuation value of a defect on a semiconductor wafer,
- the defect quantification method comprising:
- a step of classifying a defect image;
- a step of setting a measurement region and a measurement location for each of the defect image and a reference image corresponding to the defect image on the basis of the defect image classification result;
- and
- a step of calculating an evaluation value of a defect by using each measurement value obtained from the measurement location of the defect image and the reference image.
A defect qua ation device for calculating an evaluation value of a defect on a semiconductor wafer, comprising:
- a defect image classification unit for classifying a defect image;
- an image measurement processing unit for setting a measurement region and a measurement location for a defect image and a reference image on the basis of a classification result of the defect image classification unit, and performing measurement processing in accordance with the measurement region and the measurement location that have been set;
- and
- a defect quantification unit for calculating an evaluation value of a defect by using a measurement value obtained from the measurement location of the defect image and the reference image.
A defect evaluation value display device being a display device of an evaluation value of a defect on a semiconductor wafer,
- wherein the defect evaluation value display device displays at least one of a defect image and a reference image,
- a measurement region or a measurement location according to a type of a defect is displayed on at least one of a defect image and a reference image, and
- a defect evaluation value is also displayed.
Dependencies are inferred from the claim text.