Method for triple-patterning friendly placement
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsMeng-Kai HSU, Yuan-Te Hou, Wen-Hao Chen
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Abstract
The present disclosure is directed to a method for triple-patterning friendly placement. The method can include creating cell attributes identifying potential risk for triple-patterning design rule checking (TP DRC) violations in both a vertical and a horizontal propagation in a placement region. Based on these cell attributes, placement blockages can be inserted to prevent TP DRC violations after cell placement.
Claims20
A method for triple-patterning placement, the method comprising:
- identifying one or more triple-patterning design rule checking (“DRC”) violations in a placement region;
- inserting one or more placement blockages based on the identified one or more triple-patterning design rule checking violations;
- placing a plurality of cells in a chip design to provide a design layout;
- and
- outputting the design layout to a machine readable storage medium, wherein the outputted design layout being configured to manufacture a set of masks used in integrated circuit fabrication processes.
An article of manufacture comprising a non-transitory computer readable medium having computer program logic stored thereon that, when executed by a computing device, causes the computing device to perform operations for triple-patterning placement, the operations comprising:
- identifying one or more triple-patterning design rule checking (DRC) violations in a placement region;
- inserting one or more placement blockages based on the identified one or more triple-patterning design rule checking violations;
- placing a plurality of cells in a chip design to provide a design layout;
- and
- outputting the design layout to a machine readable storage medium, wherein the outputted layout being configured to manufacture a set of masks used in integrated circuit fabrication processes.
A system for generating a detailed placement, the system comprising:
- a memory that stores instructions for triple-patterning placement;
- a processor configured to:
- identify a cell with one or more triple-patterning DRC violations in at least one of a vertical direction or a horizontal direction;
- insert one or more placement blockages based on the identified one or more triple-patterning design rule checking violations;
- place a plurality of cells in a chip design to provide a design layout;
- and
- output the design layout to a machine readable storage medium, wherein the outputted design layout is configured to manufacture a set of masks used in integrated circuit fabrication processes.
Dependencies are inferred from the claim text.