Particle etching or depositing evolutionary simulation method and device and computer readable medium

A non-transient computer readable medium, storing an instruction set thereon which, when being executed by a processor, guides the processor to perform an etching or depositing evolutionary simulation function, wherein the function comprises:

• step 1, obtaining an initial profile;
• p1 step 2, sampling a series of areas for the profile, performing an evolution process on each of the series of areas by using a micro etching or depositing method to obtain a micro evolutionary computation result, wherein incident particles vs. substrate is modeled by using the micro etching or depositing method, so that the particles are subjected to automatic dynamics evolution through a potential function or a set rule to obtain the change of the substrate under action of incident ions or neutral particles, the change being regarded as the depositing or etching result of these particles on the substrate;
• step 3, obtaining macro profile evolution parameters of each sampled area based on the micro evolutionary computation result of corresponding sampled area;
• step 4, performing macro profile evolutionary computation, comprising:
• performing profile evolutionary computation based on the macro evolution parameters by using a macro profile evolution method until a predetermined pause condition or evolution termination condition is met, obtaining a new profile and storing the profile evolution result, wherein in the macro profile evolution method, an overall morphology etched and deposited under the action of a large number of particles is obtained through evolution by giving an etching yield, a depositing yield, an etching rate or depositing rate of a certain material under action of a certain particle flow;
• and
• step 5, judging whether the termination condition is met, if yes, terminating evolution, and if not, repeating the steps 2-4.

A particle etching or depositing evolutionary simulation device applied to a material surface, which is used for predicting a morphology of a material surface to be etched or deposited after etching or depositing simulation is performed, the particle etching or depositing evolutionary simulation device comprising:

• an initial profile obtaining component, configured to obtain an initial profile;
• a profile sampling and micro evolution component, configured to sample a series of areas for the profile, and perform an evolution process on each of the series of areas by using the micro etching or depositing method to obtain a micro evolutionary computation result, wherein incident particles vs. substrate is modeled by using a micro etching or depositing method, so that the particles are subjected to automatic dynamics evolution through a potential function or a set rule to obtain change of a substrate under action of incident ions or neutral particles, the change being regarded as the depositing or etching result of these particles on the substrate;
• a macro profile evolution parameter obtaining component, configured to obtain macro evolution parameters of each sampled area based on the micro evolutionary computation result of corresponding sampled area;
• a macro profile evolution component, configured to perform macro profile evolutionary computation, comprising:
• performing profile evolutionary computation based on the macro evolution parameters by using a macro profile evolution method until a predetermined pause condition or evolution termination condition is met, obtaining a new profile and storing the profile evolution result, wherein in the macro profile evolution method, an overall morphology etched and deposited under action of a large number of particles is obtained through evolution by giving etching yield, depositing yield, etching rate or depositing rate of a certain material under action of a certain particle flow;
• and
• an iteration control component, configured to judge whether the termination condition is met, if yes, terminate evolution, and if not, enable the profile sampling and micro evolution component, the macro profile evolution parameter obtaining component and the macro profile evolution component to repeat operations.