Dual loop susceptor temperature control system

A system for processing a substrate, comprising:

• a transfer chamber;
• a plurality of processing chambers coupled to the transfer chamber, each processing chamber having a substrate support assembly;
• and
• a temperature control system configured to control a temperature of a first substrate support assembly in a first processing chamber, comprising:
• a remote fluid source having a first reservoir and a second reservoir;
• and
• a main frame system coupled with the remote fluid source, comprising:
• a first fluid loop coupled to, and configured to receive a first fluid from, the first reservoir;
• a second fluid loop coupled to, and configured to receive a second fluid from, the second reservoir;
• and
• a first proportioning valve having a first inlet in communication with the first fluid loop and a second inlet in communication with the second fluid loop, the first proportioning valve having an outlet configured to flow a third fluid comprised of either the first fluid, the second fluid, or a selectively proportional mixture thereof.

A method of controlling a temperature of a substrate support assembly, comprising:

• circulating a first fluid having a first temperature in a first fluid loop;
• circulating a second fluid having a second temperature in a second fluid loop;
• mixing the first fluid and the second fluid in a proportioning valve, the proportioning valve configured to create a third fluid having a third temperature;
• and
• providing the third fluid to a substrate support assembly in a processing chamber, wherein the third fluid is configured to control a temperature of the substrate support assembly.