Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method

An exposure method of illuminating a mask with an illumination light via an illumination optical system and exposing a substrate with the illumination light via a projection optical system, the method comprising:

• moving the mask with a mask stage system having a first stage and a first motor, the first stage being disposed above the projection optical system and holding the mask, and the first motor driving the first stage;
• measuring positional information of the first stage, with a first encoder system in which one of a first head and a first grating section is provided at the first stage, and which has a plurality of the first heads that each irradiate the first grating section having a reflection type grating with a first measurement beam;
• moving the substrate, with a substrate stage system having a second stage and a second motor, the second stage being disposed below the projection optical system and holding the substrate, and the second motor driving the second stage;
• measuring positional information of the second stage, with a second encoder system that has a plurality of second heads, the plurality of second heads each irradiating a second grating section having a reflection type grating with a second measurement beam, and the reflection type grating being disposed substantially parallel to a predetermined plane that is orthogonal to an optical axis of the projection optical system;
• and
• controlling the first motor and the second motor based on measurement information of the first encoder system and measurement information of the second encoder system, respectively, wherein
• in an exposure operation of the substrate, each of a plurality of areas of the substrate is exposed by scanning exposure in which the mask and the substrate are each moved relative to the illumination light, and
• in the scanning exposure, at least one of the first and the second stages is moved so that a measurement error of at least one of the first and the second encoder systems is compensated, the measurement error occurring due to at least one of the first grating section, the second grating section, the first heads and the second heads.

A making method of an exposure apparatus that has an illumination optical system to illuminate a mask with an illumination light and a projection optical system to project a pattern image of the illuminated mask onto a substrate, the method comprising:

• providing a mask stage system having a first stage and a first motor, the first stage being disposed above the projection optical system and configured to hold the mask, and the first motor driving the first stage;
• providing a first encoder system in which one of a first head and a first grating section is provided at the first stage, and which has a plurality of the first heads that each irradiate the first grating section having a reflection type grating with a first measurement beam, and measures positional information of the first stage;
• providing a substrate stage system having a second stage and a second motor, the second stage being disposed below the projection optical system and configured to hold the substrate, and the second motor driving the second stage;
• providing a second encoder system that has a plurality of second heads and measures positional information of the second stage, the plurality of second heads each irradiating a second grating section having a reflection type grating with a second measurement beam, and the reflection type grating being disposed substantially parallel to a predetermined plane that is orthogonal to an optical axis of the projection optical system;
• and
• providing a controller that controls the first motor and the second motor based on measurement information of the first encoder system and measurement information of the second encoder system, respectively, wherein
• in an exposure operation of the substrate, each of a plurality of areas of the substrate is exposed by scanning exposure in which the mask and the substrate are each moved relative to the illumination light, and
• in the scanning exposure, the controller controls movement of at least one of the first and the second stages to compensate for a measurement error of at least one of the first and the second encoder systems that occurs due to at least one of the first grating section, the second grating section, the first heads and the second heads.