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US 2017/0322491 A1Published application
Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group
AssigneeNissan Chemical Industries, Ltd.
InventorsWataru SHIBAYAMA, Kenji TAKASE, Rikimaru SAKAMOTO
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Abstract
A resist underlayer film forming composition for lithography that can be used as a hard mask. The composition can improve pattern resolution due to having a trihalogenoacetamide skeleton. A resist underlayer film forming composition for lithography comprising a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis condensate thereof, or a combination thereof as a silane, wherein the hydrolyzable silane comprises a silane having a halogen-containing carboxylic acid amide group.
Claims11
A resist underlayer film forming composition for lithography comprising:
- a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis condensate thereof, or a combination thereof as a silane, wherein
- the hydrolyzable silane comprises a hydrolyzable silane having a halogen-containing carboxylic acid amide group.
Dependencies are inferred from the claim text.