Chemically amplified positive-type photosensitive resin composition
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsKazuaki EBISAWA, Yuta YAMAMOTO
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AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsKazuaki EBISAWA, Yuta YAMAMOTO
Estimating the term…
A chemically amplified positive-type photosensitive resin composition capable of suppressing occurrence of footing in which the width of the bottom becomes narrower than that of the top in a nonresist section, denaturation of the surface of the metal substrate, and occurrence of a development residue, when a resist pattern serving as a template for a plated article is formed on a metal surface of the substrate having the metal surface by using the composition; a method for manufacturing a substrate with a template by using the composition; and a method for manufacturing a plated article using the substrate with the template. A mercapto compound having a specific structure is contained in the chemically resin composition which includes an acid generator, and a resin whose solubility in alkali increases under the action of acid.
A chemically amplified positive-type photosensitive resin composition, comprising:
Dependencies are inferred from the claim text.