Photosensitive resin composition, production method for resin film, production method for organic semiconductor element, and fluorine-containing polymer

A fluorinated polymer having units represented by the following formula (u1) and units represented by the following formula (u21) and having a fluorine atom content of at least 47 mass %:

• wherein each of R1 and R2 which are independent of each other, is a hydrogen atom, a methyl group, an ethyl group or a halogen atom,
• each of X11, X12, X21 and X22 which are independent of one another, is a hydrogen atom or a halogen atom,
• each of Q1 and Q2 which are independent of each other, is a bivalent linking group,
• Rf1 is a C1-10 perfluoroalkyl group or a C2-10 perfluoroalkyl group having an etheric oxygen atom between carbon-carbon atoms,
• Rf2 is a C1-10 perfluoroalkylene group or a C2-10 perfluoroalkylene group having an etheric oxygen atom between carbon-carbon atoms, and
• Z1 is a monovalent organic group having a polymerizable carbon-carbon double bond.