Back to results
US 2017/0322343 A1Published application
Microlithographic projection exposure apparatus
AssigneeCarl Zeiss SMT GmbH
InventorsVladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
Life of this patent
Estimating the term…
Abstract
The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.
Claims1
An optical system, comprising:
- a first optical element,
- a second optical element,
- a first antireflection coating supported by the first optical element,
- a second antireflection coating supported either by the first optical element or by the second optical element;
- wherein:
- within a first incidence angle range, the first antireflection coating has a polarisation-dependent reflectivity which is greater for s-polarised light than for p-polarised light;
- within a second incidence angle range, the second antireflection coating has a polarisation-dependent reflectivity which is less for s-polarised light than for p-polarised light;
- the first and second antireflection coatings are arranged in a beam path of projection light so that their polarisation-dependent differences in reflectivity at least partially compensate each other;
- and
- the optical system is a microlithographic optical system.
7 more elements
Dependencies are inferred from the claim text.