X-ray fluorescence spectrometer
AssigneeRigaku Corporation
InventorsYasujiro YAMADA, Shinya HARA, Makoto DOI
Life of this patent
Estimating the term…
Abstract
A measurement line evaluation unit (23): calculates, for all of specified measurement lines, estimated measured intensities by theoretical calculation on the basis of a composition and/or a thickness specified for a thin film; changes, by a predetermined amount, only an estimated measured intensity of one measurement line, and obtains quantitative values of the composition and/or the thickness of the thin film after change of the estimated measured intensity, for each changed measurement line, by a fundamental parameter method; and estimates a quantitative error and/or determines possibility of analysis, on the basis of the obtained quantitative values and the specified composition and/or the specified thickness.
Claims2
An X-ray fluorescence spectrometer which irradiates, with primary X-rays, a sample having a single-layer or multi-layer thin film formed independently or on a substrate, and obtains quantitative values of a composition and/or a thickness of the thin film by a fundamental parameter method on the basis of measured intensities of generated secondary X-rays, the spectrometer comprising:
- a measurement line evaluation unit configured to estimate a quantitative error and/or to determine possibility of analysis, for analysis using measurement lines which are secondary X-rays of which the intensities are to be measured;
- and
- a display control unit configured to cause a display to display the quantitative error and/or the possibility of analysis obtained by the measurement line evaluation unit, wherein
- the measurement line evaluation unit
- calculates, for all specified measurement lines, estimated measured intensities by theoretical intensity calculation and apparatus sensitivity on the basis of a composition and/or a thickness specified for the thin film,
- repeats a process of, on the basis of a set of estimated measured intensities obtained by changing, by a predetermined amount, only an estimated measured intensity of one measurement line among a set of the calculated estimated measured intensities, obtaining quantitative values of the composition and/or the thickness of the thin film after change of the estimated measured intensity by the fundamental parameter method, while changing a measurement line of which the estimated measured intensity is to be changed, and
- estimates the quantitative error and/or determines the possibility of analysis, on the basis of the obtained quantitative values and the specified composition and/or the specified thickness.
An X-ray fluorescence spectrometer which irradiates, with primary X-rays, a sample having a single-layer or multi-layer thin film formed independently or on a substrate, and obtains quantitative values of a composition and/or a thickness of the thin film by a fundamental parameter method on the basis of measured intensities of generated secondary X-rays, the spectrometer comprising:
- a measurement line evaluation unit configured to estimate a quantitative error and/or determine possibility of analysis, and to select an optimum combination of measurement lines which are secondary X-rays of which the intensities are to be measured, for analysis using the measurement lines;
- and
- a display control unit configured to cause a display to display the quantitative error and/or the possibility of analysis, and the optimum combination of the measurement lines obtained by the measurement line evaluation unit, wherein
- the measurement line evaluation unit
- calculates, for all the measurement lines of which the intensities can be measured, estimated measured intensities by theoretical intensity calculation and apparatus sensitivity on the basis of a composition and/or a thickness specified for the thin film,
- creates combinations of the measurement lines for obtaining the quantitative values of the composition and/or the thickness of the thin film, from all the measurement lines of which the intensities can be measured,
- repeats, for each combination of the measurement lines, a process of obtaining quantitative values of the composition and/or the thickness of the thin film after change of an estimated measured intensity by the fundamental parameter method on the basis of a set of estimated measured intensities obtained by changing, by a predetermined amount, only the estimated measured intensity of one measurement line among a set of the calculated estimated measured intensities of the measurement lines included in the combination, while changing a measurement line of which the estimated measured intensity is to be changed, and
- estimates the quantitative error and/or determines the possibility of analysis, and selects an optimum combination of the measurement lines, on the basis of the obtained quantitative values and the specified composition and/or the specified thickness.
Dependencies are inferred from the claim text.