Film-Forming Apparatus

A film-forming apparatus, comprising:

• a rotary shaft;
• a rotary stage connected to the rotary shaft and configured to hold a plurality of wafers in a plurality of placement regions disposed in a circumferential direction with respect to a central axis line of the rotary shaft;
• a susceptor configured to accommodate the rotary stage in an internal space thereof;
• a gas supply mechanism configured to generate a flow of a process gas along a direction orthogonal to the central axis line from the outside of the rotary stage in the internal space;
• a container configured to accommodate the susceptor;
• a first heat insulating material installed between the container and the susceptor so as to cover the susceptor;
• and
• a second heat insulating material installed in the internal space and installed in a heat insulating region located more outward with respect to the central axis line than positions in the plurality of placement regions nearest to the central axis line and more inward with respect to the central axis line than positions in the plurality of placement regions farthest from the central axis line.