Substrate holder for vertical galvanic metal deposition
AssigneeAtotech Deutschland GmbH
InventorsArnulf FENDEL, Ralph RAUENBUSCH, Tobias BUSSENIUS
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AssigneeAtotech Deutschland GmbH
InventorsArnulf FENDEL, Ralph RAUENBUSCH, Tobias BUSSENIUS
Estimating the term…
A substrate holder for vertical galvanic metal deposition on a substrate, comprising a first substrate holder part and a second substrate holder part, wherein both said parts comprise an inner metal comprising part and an outer non-metallic part in which the substrate holder further comprises a hanging element in each substrate holder part, a first sealing element in each substrate holder part, a second sealing element between the inner metal comprising part and the outer non-metallic part of the substrate holder, a fastening system for detachably fastening both substrate holder parts to each other, a first contact element in each substrate holder part for forwarding current from an outer source through the hanging element to the at least second contact element, and a second contact element in each substrate holder part for forwarding current from the at least first contact element to the substrate to be treated.
Substrate holder for vertical galvanic metal deposition on a substrate to be treated comprising a first substrate holder part and a second substrate holder part, wherein both substrate holder parts comprise an inner metal comprising part and an outer non-metallic part characterized in that the substrate holder further comprises
(canceled)
Dependencies are inferred from the claim text.