Coatings formed from the deposition of plasma-activated adducts
AssigneesSouthwest Research Institute, Shell Oil Company
InventorsMichael A. MILLER, Ronghua WEI, Gregory J. HATTON
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Abstract
A fluoro-organosiloxane composition, coating and process for depositing the coating. Substituted tetramethylenedisiloxane precursor at a flow rate (QsTMDSO) and perfluorinated propylene oxide precursor at a flow rate (QPFPO) are introduced into a process chamber at a flow rate ratio (QsTMDSO/QPFPO) in the range of 0.1 to 2.0 (g/(hr·sccm)). A pulsed DC voltage is applied to a substrate and a fluoro-organosiloxane coating is deposited on the substrate, wherein the coating exhibits a water contact angle in oil (WCA/O) of greater than 155°.
Claims18
A process for the deposition of a fluoro-organosiloxane coating, comprising:
- providing a process chamber including one or more tubular substrates and an electrode positioned in said tubular substrate;
- reducing pressure in said process chamber to a first pressure in the range of 10 mTorr to 40 mTorr;
- introducing a substituted tetramethylenedisiloxane (sTMDSO) precursor
- wherein R1 and/or R2 are selected from a carbon-hydrogen alkyl group wherein one or more of the carbon-hydrogen atoms in the alkyl group may be replaced by a carbon-fluorine linkage and wherein said sTMDSO precursor is introduced at a flow rate (QsTMDSO);
- introducing a perfluorinated propylene oxide (PFPO)
- wherein R1 and/or R2 may a F atom or a perfluorinated alkyl group wherein said perfluorinated propylene oxide precursor is introduced at a flow rate (QPFPO);
- setting a flow rate ratio (QsTMDSO/QPFPO) in the range of 0.1 to 2.0 (g/(hr—sccm));
- applying a pulsed DC voltage to said tubular substrate;
- and
- depositing a fluoro-organosiloxane coating on said tubular substrate.
A process for the deposition of a fluoro-organosiloxane coating, comprising:
- providing a process chamber including one or more substrates to be coated within said process chamber where said substrate is the anode or cathode of an electrical circuit;
- reducing pressure in said process chamber to a first pressure in the range of 10 mTorr to 40 mTorr;
- introducing a substituted tetramethylenedisiloxane (sTMDSO) precursor
- wherein R1 and/or R2 are selected from a carbon-hydrogen alkyl group wherein one or more of the carbon-hydrogen atoms in the alkyl group may be replaced by a carbon-fluorine linkage and wherein said sTMDSO precursor is introduced at a flow rate (QsTMDSO);
- introducing a perfluorinated propylene oxide (PFPO)
- wherein R1 and/or R2 may a F atom or a perfluorinated alkyl group wherein said perfluorinated propylene oxide precursor is introduced at a flow rate (QPFPO);
- setting a flow rate ratio (QsTMDSO/QPFPO) in the range of 0.1 to 2.0 (g/(hr·sccm));
- providing a second electrode to complete said circuit and applying a pulsed DC voltage to said substrate;
- and
- depositing a fluoro-organosiloxane coating on said substrate.
Dependencies are inferred from the claim text.