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US 2017/0321325 A1Published application
Apparatus And Methods For Depositing ALD Films With Enhanced Chemical Exchange
AssigneeApplied Materials, Inc.
InventorTatsuya E. Sato
Life of this patent
Estimating the term…
Abstract
Gas injector units for processing chambers having one or more of scavenging ports, differential pressure ports and variable surfaces for variable injector to substrate gap distances are described. Gas distribution assemblies and processing chambers incorporating the gas injector units are also described.
Claims20
A gas injector unit comprising:
- a first reactive gas port having a depth and width;
- a first vacuum port surrounding the first reactive gas port, the first vacuum port having a width and depth;
- a second reactive gas port having a depth and width;
- a second vacuum port surrounding the second reactive gas port, the vacuum port having a width and depth;
- a purge gas port between the first vacuum port and the second vacuum port, the purge gas port having a width and depth;
- and
- a scavenging vacuum port between the first vacuum port and the purge gas port, the scavenging vacuum port having a width and depth.
4 more elements
A processing chamber comprising:
- a gas distribution assembly comprising a plurality of wedge-shaped gas injector units arranged in a circle, at least one of the wedge-shaped gas injector units comprising
- a first reactive gas port surrounded by a first vacuum port,
- a first scavenging vacuum port adjacent the first vacuum port on an opposite side than the first reactive gas port,
- a second reactive gas port surrounded by a second vacuum port,
- a second scavenging vacuum port adjacent the second vacuum port on an opposite side than the first reactive gas port,
- a purge gas port between the first scavenging port and the second reactive gas port, and
- a purge gas port adjacent the second scavenging vacuum port on a side opposite the second reactive gas port;
- and
- a susceptor assembly having a top surface with a plurality of recesses therein, the recesses sized to support a substrate.
6 more elements
A processing chamber comprising:
- a gas distribution assembly comprising a plurality of wedge-shaped gas injector units arranged in a circle, at least one of the wedge-shaped gas injector units comprising
- a front surface;
- a first reactive gas port surrounded by a first vacuum port,
- a second reactive gas port surrounded by a second vacuum port,
- a purge gas port between the first vacuum port and the second vacuum port, and
- a purge gas port adjacent the second vacuum port on a side opposite the second reactive gas port;
- and
- a susceptor assembly having a top surface with a plurality of recesses therein, the recesses sized to support a substrate, the susceptor assembly movable to form a gap between the top surface and the front surface,
- wherein the gaps between the top surface and the front surface adjacent the first vacuum port and the second vacuum port is less than the gap between the top surface and the front surface adjacent the purge gas ports.
6 more elements
Dependencies are inferred from the claim text.