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US 2017/0321121 A1Published application
Etching solution capable of suppressing particle appearance
AssigneeOci Company Ltd.
InventorsHoseong Yoo, Seunghyun Han, Wook Chang, Yongil Kim
Life of this patent
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Abstract
The present disclosure relates to an etching solution capable of suppressing particle appearance including a first silane compound in which three or more hydrophilic functional groups are independently bonded to a silicon atom and a second silane compound in which one or two hydrophilic functional groups are independently bonded to a silicon atom. n
Claims15
An etching solution for suppressing particle appearance comprising:
- an aqueous solution including at least one acid of an inorganic acid and an organic acid;
- a first silane compound including 1 to 6 silicon atoms where at least one silicon atom is bonded to three or more hydrophilic functional groups;
- a second silane compound including 1 to 6 silicon atoms where the number of hydrophilic functional groups bonded to one silicon atom is a maximum of 2;
- and
- a fluorine-containing compound.
2 more elements
Dependencies are inferred from the claim text.