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US 2017/0321086 A1Published application
Polishing composition for magnetic disc substrate
AssigneeYamaguchi Seiken Kogyo Co., Ltd.
InventorJunichiro ANDO
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Abstract
Embodiments provide a polishing composition for a magnetic disc substrate including colloidal silica, a phosphorus-containing compound, a water-soluble polymer compound, and water. According to at least one embodiment, the water-soluble polymer compound is a copolymer having a structural unit derived from an unsaturated aliphatic carboxylic acid and a structural unit derived from an unsaturated amide.
Claims13
A polishing composition for a magnetic disc substrate, comprising:
- colloidal silica;
- a phosphorus-containing compound;
- a water-soluble polymer compound;
- and
- water, wherein the water-soluble polymer compound is a copolymer containing a structural unit derived from an unsaturated aliphatic carboxylic acid and a structural unit derived from an unsaturated amide.
2 more elements
Dependencies are inferred from the claim text.