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AssigneeStamicarbon B.V.
InventorsBrian Sayre HIGGINS, John Marshall TATE, III, Robert Arthur YATES, Marcel Julien POMERLEAU, Jon Michael HEON, Wilfried Marc Renaat DIRKX, Juan Coloma GONZÁLEZ
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Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).
A method for removing submicron particles from a gas stream, the method comprising:
A gas stream treatment system, comprising two Venturi stages in series, wherein each of said Venturi stages comprises a horizontally placed Venturi ejector comprising a converging part, a throat, and a diverging tube part, and a nozzle for spraying into said throat, wherein said Venturi stages are placed above each other, and wherein each Venturi stage comprises a scrubbing liquid recirculation loop comprising a pump for pressurizing and recirculating scrubbing liquid to said nozzle, wherein the Venturi stages have separate recirculation loops.
A method of modifying an existing prilling tower, comprising installing a gas stream treatment system comprising a Venturi ejector on top of the prilling tower.
Dependencies are inferred from the claim text.